Resistance électrique de films en argent dans un champ magnétique aux basses températures

✍ Scribed by par A. Van Itterbeek; A. De Bock

• Publisher: Elsevier Science
• Year: 1946
• Weight: 536 KB
• Volume: 12
• Category: Article
• ISSN: 0031-8914
• DOI: 10.1016/s0031-8914(46)80031-4

✦ Synopsis

Measurements

are made on the variation of the electric resistance of thin silver films under the action of a magnetic field perpendicular to the current at liquid oxygen and liquid nitrogen temperatures.

For the measurements at liquid oxygen temperatures a specially constructed cryostat was used with the purpose to eliminate the action of the magnetic field on the paramagnetic oxygen. For the silver films we found: AR,,lR,, = B . H2, R,, resistance in field H and at T" K., B is a constant depending upon the specific resistivity.

Taking into account the residual resistivity, we found AR,,/(R,, -Z)