✦ LIBER ✦
Resist thickness influence on depth of focus - A key question for advanced i-line and DUV lithography
✍ Scribed by U. Boettiger; T. Fischer; A. Grassmann; H. Moritz; M. Reuhman-Huisken
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 379 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0167-9317
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