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Resist process issues related to the glass transition changes in chemically amplified resist films

✍ Scribed by I. Raptis; D. Niakoula; E. Tegou; V. Bellas; E. Gogolides; P. Argitis; K.G. Papadokostaki; A. Ioannidis


Book ID
114155523
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
233 KB
Volume
67-68
Category
Article
ISSN
0167-9317

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