✦ LIBER ✦
Resist parameter sensitivity analysis based on calibrated simulation for understanding resist limitations in next generation lithography
✍ Scribed by K. Elian; B. Ruppenstein; C. Noelscher; A. Heubner; T. Muelders
- Book ID
- 104050502
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 223 KB
- Volume
- 83
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.