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Resist-assisted atom lithography with group III elements

✍ Scribed by A. Camposeo; O.M. Maragò; B. Fazio; B. Klöter; D. Meschede; U. Rasbach; C. Weber; E. Arimondo

Book ID: 106027387
Publisher: Springer
Year: 2006
Tongue: English
Weight: 312 KB
Volume: 85
Category: Article
ISSN: 0721-7269
DOI: 10.1007/s00340-006-2481-x

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