𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Residual stresses and ion implantation effects in Cr thin films

✍ Scribed by A Misra; S Fayeulle; H Kung; T.E Mitchell; M Nastasi


Book ID
114170727
Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
188 KB
Volume
148
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Relation between residual stresses and m
✍ J. Tranchant; P.Y. Tessier; J.P. Landesman; M.A. Djouadi; B. Angleraud; P.O. Ren πŸ“‚ Article πŸ“… 2008 πŸ› Elsevier Science 🌐 English βš– 1019 KB

Mo(Cr) thin films were deposited by an Ionized Physical Vapor Deposition process i.e. Ionized Magnetron Sputtering (IMS). This deposition technique enables to ionize the neutral metallic sputtered species by a secondary plasma generated through a radio-frequency (RF: 13.56 MHz) powered coil. Thus, b