✦ LIBER ✦
Residual post anneal damage of Ge and C co-implantation of Si determined by quantitative RBS-channelling
✍ Scribed by A Nejim; N.P Barradas; C Jeynes; F Cristiano; E Wendler; K Gärtner; B.J Sealy
- Book ID
- 114169883
- Publisher
- Elsevier Science
- Year
- 1998
- Tongue
- English
- Weight
- 152 KB
- Volume
- 139
- Category
- Article
- ISSN
- 0168-583X
No coin nor oath required. For personal study only.