Representation of ion implantation projected range profiles by Pearson distribution curves for silicon technology

✍ Scribed by M.D.J. Bowyer; D.G. Ashworth; R. Oven

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 791 KB
• Volume: 35
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(92)90016-6