Replication of sub-40 nm gap nanoelectrodes over an 8-in. substrate by nanoimprint lithography
✍ Scribed by J. Tallal; D. Peyrade; F. Lazzarino; K. Berton; C. Perret; M. Gordon; C. Gourgon; P. Schiavone
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 227 KB
- Volume
- 78-79
- Category
- Article
- ISSN
- 0167-9317
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✦ Synopsis
We present the replication of sub-40 nm nanoelectrodes over an 8-in. silicon wafer using nanoimprint lithography (NIL). Three different NIL polymers (NEB22A2, PMMA and Polycarbonate) are investigated as potential replication candidates. For each polymer resist, we study the single step imprint of both micrometric contact pads and nanoelectrodes. Flow capability of the polymers over large area, imprinting small scale features to obtain nanogaps, and reproducibility over an 8-in. silicon wafer are investigated to define the most suitable resist.