✦ LIBER ✦

Removal of SO2from Gas Streams by Oxidation using Plasma-Generated Hydroxyl Radicals

✍ Scribed by Mindong Bai; Zhitao Zhang; Mindi Bai; Chengwu Yi; Xiyao Bai

Publisher: Springer
Year: 2006
Tongue: English
Weight: 183 KB
Volume: 26
Category: Article
ISSN: 0272-4324
DOI: 10.1007/s11090-006-9016-4

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Removal of SO2and the simultaneous remov

Removal of SO2and the simultaneous removal of SO2and NO from simulated flue gas streams using dielectric barrier discharge plasmas

✍ Moo Been Chang; Mark J. Kushner; Mark J. Rood 📂 Article 📅 1992 🏛 Springer 🌐 English ⚖ 634 KB

Removal of Proteinaceous Soils Using Hyd

Removal of Proteinaceous Soils Using Hydroxyl Radicals Generated by the Electrolysis of Hydrogen Peroxide

✍ Koreyoshi Imamura; Yoichiro Tada; Hirohumi Tanaka; Takaharu Sakiyama; Kazuhiro N 📂 Article 📅 2002 🏛 Elsevier Science 🌐 English ⚖ 258 KB

Removal of CO2 and/or SO2 from gas strea

Removal of CO2 and/or SO2 from gas streams by a membrane absorption method

✍ Susumu Nii; Hiroshi Takeuchi 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 990 KB

Regenerative Adsorption and Removal of H

Regenerative Adsorption and Removal of H2S from Hot Fuel Gas Streams by Rare Earth Oxides.

✍ Maria Flytzani-Stephanopoulos; Mann Sakbodin; Zheng Wang 📂 Article 📅 2006 🏛 John Wiley and Sons ⚖ 10 KB

Reduction and removal of SO2 and NOx fro

Reduction and removal of SO2 and NOx from simulated flue gas using iron oxide as catalyst/absorbent

✍ David T. Clay; Scott Lynn 📂 Article 📅 1975 🏛 American Institute of Chemical Engineers 🌐 English ⚖ 972 KB

Native oxide removal from SiGe using mix

Native oxide removal from SiGe using mixtures of HF and water delivered by aqueous, gas, and supercritical CO2 processes

✍ Bo Xie; Gerardo Montaño-Miranda; Casey C. Finstad; Anthony J. Muscat 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 282 KB

HF and water delivered using liquid, gas, and supercritical CO 2 phases were used to remove native oxides and suboxides from SiGe surfaces containing 15-30% Ge. X-ray photoelectron spectroscopy was used to monitor the Si 2p and Ge 2p 3/2 peaks as a function of the process type, HF concentration, and