✦ LIBER ✦
Removal of residual oxide layer formed during chemical–mechanical-planarization process for lowering contact resistance
✍ Scribed by Sunwoo Lee; Boong-Joo Lee
- Book ID
- 113919605
- Publisher
- Elsevier Science
- Year
- 2012
- Tongue
- English
- Weight
- 797 KB
- Volume
- 206
- Category
- Article
- ISSN
- 0257-8972
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