✦ LIBER ✦
Removal of post-etch photoresist and sidewall residues using organic solvent and additive combined with physical forces
✍ Scribed by Q.T. Le; M. Claes; T. Conard; E. Kesters; M. Lux; G. Vereecke
- Book ID
- 104052060
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 493 KB
- Volume
- 86
- Category
- Article
- ISSN
- 0167-9317
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