✦ LIBER ✦
Removal of HF/CO2 post-etch residues from pattern wafers using water-in-carbon dioxide microemulsions
✍ Scribed by Jae Mok Jung; Hullathy Subban Ganapathy; Haldorai Yuvaraj; Keith P. Johnston; Kwon Taek Lim
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 656 KB
- Volume
- 86
- Category
- Article
- ISSN
- 0167-9317
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