✦ LIBER ✦
Remote plasma etching of titanium nitride using NF3/argon and chlorine mixtures for chamber clean applications
✍ Scribed by Ronald Hellriegel; Matthias Albert; Bernd Hintze; Hubert Winzig; J.W. Bartha
- Book ID
- 108207656
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 148 KB
- Volume
- 84
- Category
- Article
- ISSN
- 0167-9317
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