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Remote charge scattering: a full Coulomb interaction approach and its impact on silicon nMOS FinFETs with HfO2gate dielectric

✍ Scribed by KangLiang Wei, James Egley, XiaoYan Liu, Gang Du


Book ID
120799688
Publisher
Science in China Press (SCP)
Year
2013
Tongue
English
Weight
626 KB
Volume
57
Category
Article
ISSN
1674-733X

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