RELY: A physics-based CAD tool for predicting time-dependent hot-electron induced degradation in MOSFET's

✍ Scribed by Shiuh-Luen Wang; Neil Goldsman; Qi Lin; Jeffrey Frey

• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 849 KB
• Volume: 36
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(93)90005-b