✦ LIBER ✦
Reliability study of methods to suppress boron transient enhanced diffusion in high-k/metal gate Si/SiGe channel pMOSFETs
✍ Scribed by Park, Min Sang; Kim, Yonghyun; Lee, Kyong Taek; Kang, Chang Yong; Min, Byoung-Gi; Oh, Jungwoo; Majhi, Prashant; Tseng, Hsing-Huang; Lee, Jack C.; Banerjee, Sanjay K.; Lee, Jeong-Soo; Jammy, Raj; Jeong, Yoon-Ha
- Book ID
- 123518544
- Publisher
- Elsevier Science
- Year
- 2013
- Tongue
- English
- Weight
- 820 KB
- Volume
- 112
- Category
- Article
- ISSN
- 0167-9317
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