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Reliability of nano-meter thick multi-layer dielectric films on poly-crystalline silicon : Y. Ohji, T. Kusaka, I. Yoshida, A. Hiraiwa, K. Lyagi, K. Mukai and O. Kasahara. Annual Proceedings of the Reliability Physics Symposium, San Diego, U.S.A., p. 55 (1987)


Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
127 KB
Volume
28
Category
Article
ISSN
0026-2714

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