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Relaxed Si1−xGex films with reduced dislocation densities grown by molecular beam epitaxy

✍ Scribed by Martin O. Tanner; Michael A. Chu; Kang L. Wang; Marjohn Meshkinpour; Mark S. Goorsky


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
323 KB
Volume
157
Category
Article
ISSN
0022-0248

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