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Relaxed GexSi1−x layer formation with reduced dislocation density grown by ultrahigh vacuum chemical vapor deposition

✍ Scribed by Luo, G.L.; Chen, P.Y.; Lin, X.F.; Tsien, P.; Fan, T.W.


Book ID
113035205
Publisher
Springer
Year
2000
Tongue
English
Weight
81 KB
Volume
70
Category
Article
ISSN
1432-0630

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