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Regrowth-process study of amorphous BF2+ion-implanted silicon layers through spectroscopic ellipsometry

✍ Scribed by S. Holgado, J. Martinez, J. Garrido, J. Piqueras

Book ID: 120783142
Publisher: Springer
Year: 1995
Tongue: English
Weight: 613 KB
Volume: 60
Category: Article
ISSN: 1432-0630
DOI: 10.1007/BF01538413

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