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Refractive index and degree of inhomogeneity of nanocrystalline TiO[sub 2] thin films: Effects of substrate and annealing temperature

โœ Scribed by Mosaddeq-ur-Rahman, Md.; Yu, Guolin; Soga, Tetsuo; Jimbo, Takashi; Ebisu, Hiroshi; Umeno, Masayoshi


Book ID
120218920
Publisher
American Institute of Physics
Year
2000
Tongue
English
Weight
489 KB
Volume
88
Category
Article
ISSN
0021-8979

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TiO 2 thin films were deposited on unheated and heated glass substrates at an elevated sputtering pressure of 3 Pa by radio frequency (RF) reactive magnetron sputtering. TiO 2 films deposited at room temperature were annealed in air for 1 h at various temperatures ranging from 300 to 600 ยฐC. The str