✦ LIBER ✦
Reflection high-energy electron diffraction real-time monitoring of an etch process implemented in molecular beam epitaxy technology: hydrogen chloride versus GaAs(001) epilayers
✍ Scribed by A. Hamoudi; T. Sogawa; T. Saitoh; J. Yumoto
- Book ID
- 106023383
- Publisher
- Springer
- Year
- 1998
- Tongue
- English
- Weight
- 104 KB
- Volume
- 67
- Category
- Article
- ISSN
- 1432-0630
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