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Reduction of polarization and swing effects in a high numerical aperture exposure system by utilizing resist antireflective coatings

✍ Scribed by H.L. Chen; W.H. Lee; Wonder Fan; S.Y. Chuang; Y.H. Lai; C.C. Lee


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
832 KB
Volume
86
Category
Article
ISSN
0167-9317

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