✦ LIBER ✦

Reduction of photoresist usage during spin coating

✍ Scribed by Fu-Chu Chou; Min-Wen Wang; Shih-Ching Gong; Zen-Gi Yang

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Spin Coating of Photoresists Using Liqui

✍ Hoggan, Erik N.; Flowers, Devin; Wang, Ke; DeSimone, Joseph M.; Carbonell, Ruben 📂 Article 📅 2004 🏛 American Chemical Society 🌐 English ⚖ 210 KB

Mathematical model of spin-coated photor

✍ Feng, Xiao-guo; Sun, Lian-chun 📂 Article 📅 2005 🏛 Optical Society of America 🌐 English ⚖ 91 KB

Fibre orientation during spin coating of

✍ E. K. Franke; D. P. Birnie 📂 Article 📅 1995 🏛 Springer 🌐 English ⚖ 287 KB

Combined flow and evaporation during spi

✍ Dunbar P. Birnie III 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 355 KB

Effect of Air Shear on Film Planarizatio

✍ Chou, Fu-Chu; Wu, Pei-Ying 📂 Article 📅 2000 🏛 The Electrochemical Society 🌐 English ⚖ 293 KB

Surface Morphology Evolution of Thin Tri

✍ Li, Xue; Han, Yanchun; An, Lijia 📂 Article 📅 2002 🏛 American Chemical Society 🌐 English ⚖ 455 KB