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Reduction of iron diffusion in silicon during the epitaxial growth of β-FeSi[sub 2] films by use of thin template buffer layers

✍ Scribed by Liu, Zhengxin


Book ID
121852632
Publisher
American Institute of Physics
Year
2004
Tongue
English
Weight
500 KB
Volume
95
Category
Article
ISSN
0021-8979

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