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Reduction of interface contamination in regrown GaAs on AlGaAs using a novel two-step HCl gas etching process

✍ Scribed by Hirotaka Kizuki; Nariaki Fujii; Motoharu Miyashita; Yutaka Mihashi; Saburo Takamiya


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
455 KB
Volume
146
Category
Article
ISSN
0022-0248

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