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Reduction of Etch Pit Density in Organometallic Vapor Phase Epitaxy-Grown GaN on Sapphire by Insertion of a Low-Temperature-Deposited Buffer Layer between High-Temperature-Grown GaN

✍ Scribed by Iwaya, Motoaki; Takeuchi, Tetsuya; Yamaguchi, Shigeo; Wetzel, Christian; Amano, Hiroshi; Akasaki, Isamu


Book ID
123617105
Publisher
Institute of Pure and Applied Physics
Year
1998
Tongue
English
Weight
180 KB
Volume
37
Category
Article
ISSN
0021-4922

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