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Reduction of charge-transport characteristics of SiGe dot floating gate memory device with ZrO2 tunneling oxide

✍ Scribed by Dong-Won Kim; Prins, F.E.; Taehoon Kim; Sungbo Hwang; Lee, C.H.; Dim-Lee Kwong; Banerjee, S.K.


Book ID
114616896
Publisher
IEEE
Year
2003
Tongue
English
Weight
403 KB
Volume
50
Category
Article
ISSN
0018-9383

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