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Reduction of boride-enhanced diffusion by point defect engineering and its application for shallow junction formation

✍ Scribed by Lin Shao; Jiarui Liu; Xuemei Wang; Hui Chen; Phillip E. Thompson; Wei-Kan Chu


Book ID
114167109
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
128 KB
Volume
206
Category
Article
ISSN
0168-583X

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