✦ LIBER ✦

Recent developments in X-ray lithography systems

✍ Scribed by C.R. Fencil

Publisher: Elsevier Science
Year: 1986
Tongue: English
Weight: 26 KB
Volume: 5
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(86)90095-x

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Percolation theory and resist developmen

Percolation theory and resist development in x-ray lithography

✍ Heinrich K. Oertel; Manfred Weiss; Ralph Dammel; Jürgen Theis 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 385 KB

Recent developments towards high resolut

Recent developments towards high resolution X-ray imaging

✍ Eberhard Spiller 📂 Article 📅 1980 🏛 Elsevier Science ⚖ 511 KB

An alignment system for X-ray lithograph

An alignment system for X-ray lithography

✍ Y. Tanaka; E. Kouno; J. Iwata 📂 Article 📅 1990 🏛 Elsevier Science 🌐 English ⚖ 285 KB

Recent developments in secondary emissio

Recent developments in secondary emission gaseous X-ray imaging detectors

✍ A. Breskin; R. Chechik; A. Akkerman; A. Gibrekhterman; V. Elkind; I. Frumkin; A. 📂 Article 📅 1994 🏛 Elsevier Science 🌐 English ⚖ 848 KB

Recent developments in intelligent syste

Recent developments in intelligent systems

✍ Vassil Sgurev; Mincho Hadjiski; Vladimir Jotsov 📂 Article 📅 2004 🏛 John Wiley and Sons 🌐 English ⚖ 32 KB

The concept of intelligent systems (IS) remains a fluid subject and perhaps that is its strength. However, much work in the area can be characterized fairly as an integration on different levels of several technology directions-intelligent control, artificial intelligence, decision support, soft com

Simulation of resist development on wafe

Simulation of resist development on wafer topography in x-ray lithography

✍ M. Weiβ; H.K. Oertel; J. Krauser 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 353 KB