✦ LIBER ✦
Real-time studies of surface roughness development and reticulation mechanism of advanced photoresist materials during plasma processing
✍ Scribed by Pal, A. R.; Bruce, R. L.; Weilnboeck, F.; Engelmann, S.; Lin, T.; Kuo, M.-S.; Phaneuf, R.; Oehrlein, G. S.
- Book ID
- 127274101
- Publisher
- American Institute of Physics
- Year
- 2009
- Tongue
- English
- Weight
- 780 KB
- Volume
- 105
- Category
- Article
- ISSN
- 0021-8979
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