Real time in situ monitoring of surfaces during glow discharge processing: NH3 and H2 plasma passivation of GaAs

✍ Scribed by Aydil, Eray S.

• Book ID: 126235658
• Publisher: AVS (American Vacuum Society)
• Year: 1995
• Tongue: English
• Weight: 527 KB
• Volume: 13
• Category: Article
• ISSN: 0734-211X
• DOI: 10.1116/1.588361