✦ LIBER ✦
Real-time control of AlN incorporation in epitaxial Hf1 − xAlxN using high-flux, low-energy (10–40 eV) ion bombardment during reactive magnetron sputter deposition from a Hf0.7Al0.3 alloy target
✍ Scribed by B.M. Howe; E. Sammann; J.G. Wen; T. Spila; J.E. Greene; L. Hultman; I. Petrov
- Book ID
- 108049185
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 602 KB
- Volume
- 59
- Category
- Article
- ISSN
- 1359-6454
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