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Reactivity between Ti and N2C2H2 mixed gas on Ti(C, N) film deposition by arc-like plasma-enhanced ion plating

✍ Scribed by H. Kajioka; K. Higuchi; Y. Kawashimo


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
501 KB
Volume
228
Category
Article
ISSN
0040-6090

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