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Reactive unbalanced magnetron sputtering of the nitrides of Ti, Zr, Hf, Cr, Mo, Ti-Al, Ti-Zr and Ti-Al-V

✍ Scribed by William D. Sproul; Michael E. Graham; Ming-Show Wong; Paul J. Rudnik

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 612 KB
Volume: 61
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(93)90216-b

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## Abstract In this investigation the electrochemical behaviour of the Ti‐13Nb‐13Zr, Ti‐6Al‐4V and Ti‐6Al‐7Nb alloys, for application as implant materials was evaluated in Hanks' solution by electrochemical techniques. The alloys were immersed in this solution for 410 days and periodically they wer