Reactive ion etching technology in thin-film-transistor processing : Y. Kuo. IBM Journal of Research and Development36(1), 69 (1992)

• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 109 KB
• Volume: 33
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(93)90236-r