✦ LIBER ✦
Reactive ion etching of indium tin oxide by SiCl4-based plasmas—substrate temperature effect
✍ Scribed by Yue Kuo
- Publisher
- Elsevier Science
- Year
- 1998
- Tongue
- English
- Weight
- 175 KB
- Volume
- 51
- Category
- Article
- ISSN
- 0042-207X
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