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Reactive Ion Etching of Cylindrical Polyferrocenylsilane Block Copolymer Micelles: Fabrication of Ceramic Nanolines on Semiconducting Substrates

✍ Scribed by L. Cao; J.A. Massey; M.A. Winnik; I. Manners; S. Riethmüller; F. Banhart; J.P. Spatz; M. Möller


Publisher
John Wiley and Sons
Year
2003
Tongue
English
Weight
270 KB
Volume
13
Category
Article
ISSN
1616-301X

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