๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Reactive Gas Magnetron Sputtering of Lithium Hydride and Lithium Fluoride Thin Films

โœ Scribed by G.B. Thompson; D.D. Allred


Book ID
112261480
Publisher
IOS Press
Year
1997
Tongue
English
Weight
865 KB
Volume
7
Category
Article
ISSN
0895-3996

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Electrical and structural properties of
โœ K.P.S.S. Hembram; Gargi Dutta; Umesh V. Waghmare; G. Mohan Rao ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 819 KB

Thin films of ZrO 2 were prepared by reactive magnetron sputtering. Annealing of the films exhibited a drastic change in the properties due to improved crystallinity and packing density. The root mean square roughness of the sample observed from atomic force microscope is about 5.75 nm which is comp