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Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films

✍ Scribed by S. Schiller; U. Heisig; K. Steinfelder; J. Strümpfel


Book ID
107862568
Publisher
Elsevier Science
Year
1979
Tongue
English
Weight
355 KB
Volume
63
Category
Article
ISSN
0040-6090

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