Films made from poly(styrene) hydroperoxide (PSOOH) and poly(vinylacetophenone) (PVAP) were exposed to long-wave (2/> 300 nm) u.v. radiation under high vacuum at 25 + I °. The presence of PVAP considerably enhanced the rate of decomposition of PSOOH, the quantum yield increasing by a factor of 2.5.
Reactions of methyl radicals with poly(vinylacetophenone) during photolysis
✍ Scribed by N.A. Weir; J. Arct
- Publisher
- Elsevier Science
- Year
- 1987
- Tongue
- English
- Weight
- 286 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0014-3057
No coin nor oath required. For personal study only.
✦ Synopsis
The photochemistry of isotopically labelled poly(vinylacetophenone) (PVAP) has been investigated, with a view to determining the point of H-atom abstraction from the polymer. Poly(ct-Dvinylacetophenone) (DPVAP) and poly [3.[3 dideuterovinyl(acetophenone) (D2PVAP) were irradiated under high vacuum with long wave u.v. radiation (>~ 300 nm). From the nature of the gaseous products, it was confirmed that both underwent initial photo-decomposition by a Norrish Type I reaction. Rates of abstraction reactions by CH3 and CH3CO radicals from DPVAP were subject to an isotope effect of 8.3; the corresponding rates for D2PVAP were about 85% of those observed for PVAP. In addition, no significant yields of deuterated products were obtained from D2PVAP. It is concluded that abstractions occur preferentially at the ~t-C-atom, in line with predictions based on the energetics of abstraction reactions. Molecular weight increases (due to cross-linking which involves interactions of macro-radicals generated by abstraction reactions) confirm the involvement of the ~-C-atom.
📜 SIMILAR VOLUMES
The kinetics of H abstraction by methyl and acetyl radicals from poly(vinyl acetophenone) (PVAP) tilms (4 x 10 ~ mm thick) have been investigated, both radicals being derived from the polymer by photolysis (2 > 300 nm) under high vacuum conditions (pressure < 10 a Pa). Differential equations have be
The kinetics of hydrogen abstraction by methyl radicals from poly(p-methoxystyrene} have been investigated, methyl radicals being produced by the photolysis ft. = 254 nm) of the polymer under high vacuum. A new differential equation has been derived to describe simultaneous diffusion and reaction of
Almtract--Upon u.v. irradiation at 2in c = 253.7 nm poly(alkyl acrylates) and poly(alkyl methacrylates) form a new absorption band around 280 nm. This band is assigned at least partly to aldehyde groups attached to the main-chain. Aldehyde groups formed upon irradiation of poly(methyl methacrylate)
## Abstract The Hg(6^3^__P__~1~) photosensitized decompositions of 3‐methyl‐1‐butene, 2‐methyl‐2‐butene, 3,3‐dimethyl‐1‐butene, and 2,3‐dimethyl‐1‐butene have been used to generate 1‐methylallyl, 1,2‐dimethylallyl, 1,1‐dimethylallyl, and 1,1,2‐trimethylallyl radicals in the gas phase at 24 ± 1°C. F
The kinetics of H abstraction by methyl and tert.butyl radicals from poly(p-tert.butyl styrene) (PTL3) films (5 × 10 3 mm thick) have been investigated at 298 K, both radicals being produced from the polymer by its exposure to short-wave u.v. radiation (2 = 254 nm) at pressures < 10 -4 Pa. Different