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Reaction kinetics and transport phenomena underlying the low-pressure metalorganic chemical vapor deposition of GaAs

โœ Scribed by N.K. Ingle; C. Theodoropoulos; T.J. Mountziaris; R.M. Wexler; F.T.J. Smith


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
974 KB
Volume
167
Category
Article
ISSN
0022-0248

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