RBS/channeling study on the annealing behavior of Cu thin films on Si(100) and (111) substrates

✍ Scribed by Takehiko Nakahara; Shigeharu Ohkura; Fumiya Shoji; Teruo Hanawa; Kenjiro Oura

• Book ID: 113281278
• Publisher: Elsevier Science
• Year: 1990
• Tongue: English
• Weight: 418 KB
• Volume: 45
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(90)90877-w