Current overview of commercially availab
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John G. Maltabes; R. Scott Mackay
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Article
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2006
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Elsevier Science
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English
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Imprint lithography has been proposed as a low cost method for next generation lithography for the manufacturing of semiconductors for the 45 nm node and below, as costs for traditional optical lithography and EUV lithography escalate to new levels that may prohibit new semiconductor devices from ev