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Radical-based reduction of phosphine sulfides and phosphine selenides by (Me3Si)3SiH

✍ Scribed by Roberto Romeo; Lucyna A Wozniak; Chryssostomos Chatgilialoglu


Book ID
104211306
Publisher
Elsevier Science
Year
2000
Tongue
French
Weight
63 KB
Volume
41
Category
Article
ISSN
0040-4039

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ChemInform Abstract: Radical-Based Reduc
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## Abstract Secondary phosphine sulfide and selenide (II) are regiospecifically added to alkyl vinyl telluride (I) under radical initiation furnishing anti‐Markovnikov‐adducts (III) (4 examples) in good yields.