Radiation degradation of copolymers of methyl methacrylate and 3-oximino-2-butanone methacrylate

✍ Scribed by Bowmer, T. N. ;Reichmanis, E. ;Wilkins, C. W. ;Hellman, M. Y.

• Book ID: 105334020
• Publisher: John Wiley and Sons
• Year: 1982
• Weight: 424 KB
• Volume: 20
• Category: Article
• ISSN: 0360-6376
• DOI: 10.1002/pol.1982.170200924

✦ Synopsis

Abstract

Copolymers of methyl methacrylate and 3‐oximino‐2‐butanone methacrylate (OM) were investigated as deep‐UV and e‐beam resists. Their increased sensitivity relative to PMMA (up to 50 times) was correlated with the radiation chemical yields of the volatile products and main chain scissions. The degradation of these copolymers, activated by the 3‐oximino‐2‐butanone entity, is discussed in terms of energy absorption mechanisms and the subsequent scission reactions.