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Radiation- and plasma-induced radical formation in fluorochlorocarbons and reactions with semiconductor materials

✍ Scribed by U. Prösch; K. Buttke; L. Tepper; K.-D. Suhrke


Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
43 KB
Volume
29
Category
Article
ISSN
0022-1139

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