Quinone-sensitized photo-polymerization of methyl methacrylate in binary solvent systems
โ Scribed by Hitoshi Kubota; Hisakazu Suzuki
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 328 KB
- Volume
- 32
- Category
- Article
- ISSN
- 0141-3910
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๐ SIMILAR VOLUMES
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Polymerization of methyl methacrylate with Grignard reagents in mixed solvent of toluene and dimethyl siilfoxide (DMSO) under ultrasonic irradiation was carried out, and the effects of ultrasonic irradiation in connection with the mixed solvent on the stereoregularity and the properties of the polym
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