Quantum imaging, quantum lithography and the uncertainty principle

✍ Scribed by Y. Shih

• Publisher: John Wiley and Sons
• Year: 2003
• Tongue: English
• Weight: 209 KB
• Volume: 51
• Category: Article
• ISSN: 0015-8208
• DOI: 10.1002/prop.200310066

✦ Synopsis

Abstract

One of the most surprising consequences of quantum mechanics is the entanglement of two or more distant particles. The “ghost” image experiment demonstrated the astonishing nonlocal behavior of an entangled photon pair. Even though we still have question in regard to fundamental issues of the entangled quantum systems, quantum entanglement has started to play important roles in practical applications. Quantum lithography is one of the hot topics. We have demonstrated a prove‐of‐principle quantum lithography experiment recently. The experimental results have beaten the classical diffraction limit by a factor of two. This is a quantum mechanical two‐photon phenomenon but not a violation of the uncertainty principle.